Plasma Expansion in H₂, He, Ar, and H₂-He Plasma

Experimental Stark Profile Determination of Some Plasma Broadened He I- and He II-Lines

für Naturforschung in cooperation with the Max Planck Society for the Advancement of Science under a Creative Commons Attribution 4.0 International License. Dieses Werk wurde im Jahr 2013 vom Verlag Zeitschrift für Naturforschung in Zusammenarbeit mit der Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. digitalisiert und unter folgender Lizenz veröffentlicht: Creative Commons Namen...

Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge

The influence of the He, Ne and Ar on Xe plasma pumped by capillary discharge process is studied theoretically and experimentally. The charge-state populations and average ionization of Xe as a function of electron temperature for pure Xe and mixed gases are calculated with a collision-radiation model. The emission of Xe 4d-4d5p 13.5 nm in 2% bandwidth is obtained by a EUV emission monitor (E-M...

Fuzzy nanostructure growth on Ta/Fe by He plasma irradiation

In this study, we show from helium (He) plasma irradiation to tantalum and iron surfaces that morphology changes in nanoscale occur on the both metals. In particular, from systematic irradiation experiments, it is identified that fuzzy nanostructures are grown on the both metals. The necessary conditions for the morphology changes are discussed based on the experimental results in terms of the ...

Plasma chemistry of He/02/SiH4 and He/N20/SiH4 mixtures for remote plasma-activated chemical-vapor deposition of silicon dioxide

Remote plasma-activated chemical-vapor deposition (RPACVD) provides a means to deposit thin dielectric films with low ion bombardment and while having high selectivity in generating precursors. In RPACVD of SiO,, gas mixtures of He/O2 or He/N20 are passed through a plasma, producing radicals and excited states that are mixed with silane downstream. Excited states produced in the plasma and prec...

Autoionization of He and Autodetachment of He- following Bombardment by H+, H2+, He+, and He Atoms